期刊
ADVANCES IN DISPLAY TECHNOLOGIES AND E-PAPERS AND FLEXIBLE DISPLAYS
卷 7956, 期 -, 页码 -出版社
SPIE-INT SOC OPTICAL ENGINEERING
DOI: 10.1117/12.874180
关键词
Multicomponent oxide transistors; roll-to-roll; self-aligned imprint lithography; oxygen vacancy; flexible display; metastability; negative bias stress
类别
A roll-to-roll process is used to fabricate amorphous silicon and amorphous multicomponent oxide (MCO) transistors on flexible substrates using self aligned imprint lithography (SAIL). SAIL solves the layer to layer alignment problem. The imprint lithography patterned MCO transistors had a mobility of 15 cm(2)V(-1) sec(-1) and an on-off ratio of 10(7). Full display arrays with data, gate, hold capacitors and cross-overs were patterned using SAIL technology. Studies of stability of the MCO transistors indicate the importance of controlling O vacancies in the material particularly the back channel. Devices subjected to -10V gate bias stress at 60C under illumination exhibited behavior consistent with state creation in the upper and lower half of the gap near the back channel interface possibly associated with O vacancy formation.
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