4.3 Article

Growth and structural characterization of strained epitaxial Hf0.5Zr0.5O2 thin films

期刊

PHYSICAL REVIEW MATERIALS
卷 2, 期 1, 页码 -

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AMER PHYSICAL SOC
DOI: 10.1103/PhysRevMaterials.2.013401

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资金

  1. Ministerio de Economia y Competitividad [MAT2014-51982-C2, MAT2015-68760-C2-1-P, MAT2017-82970-C2]
  2. regional Gobierno de Aragon through project E26
  3. FEDER funding

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Ferroelectricity was recently reported in thin films with several compositions in the HfO2-ZrO2 system with orthorhombic crystal structure. In the present paper we study the growth by pulsed laser deposition and the structural characterization of strained epitaxial Hf0.5Zr0.5O2 films on (001)-oriented yttria-stabilized zirconia (YSZ) substrates. We have determined the conditions for the coherent growth and correlated the deposition parameters with the films structure andmicrostructure studied through a combination of x-ray diffraction, electron backscatter diffraction, and scanning transmission electron microscopy. In the range of experimental parameters explored, all the films show monoclinic structure with distorted lattice parameters relative to bulk.

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