期刊
ADVANCED MATERIALS TECHNOLOGIES
卷 3, 期 8, 页码 -出版社
WILEY
DOI: 10.1002/admt.201800100
关键词
focused ion beam nanofabrication; nanoscale color printing; Si nanophotonics; structural colors; subwavelength nanostructures
资金
- IITB Monash Research academy, Mumbai, India
- Tata Consultancy Services (TCS)
Color filtering via interaction of visible light with nanostructured surfaces offers high resolution printing of structural colors. A novel approach for color filtering in reflection mode via direct fabrication of subwavelength nanostructures on high-index, low-loss, and inexpensive silicon (Si) substrate is developed. Nanostructures having a u nique geometry of tapered holes are fabricated exploiting the Gaussian nature of a gallium source focused ion beam (FIB). The fabrication process is rapid and single-step, i.e., without any pre- or postprocessing or mask preparation in contrast to previously reported nanostructures for color filtering. These nanostructures are tunable via FIB parameters and a wide color palette is created. Finite-difference time-domain (FDTD) calculations reveal that the unique tapered nanohole geometry facilitates enhanced color purity via selective absorption of a narrow band of incident light wavelengths and makes it possible to obtain a wide variety of colors suitable for realistic color printing applications. The proposed approach is demonstrated for color printing applications via fabrication of butterflies and letters on Si.
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