3.8 Proceedings Paper

Silicon in AlN: shallow donor and DX behaviors

出版社

WILEY-V C H VERLAG GMBH
DOI: 10.1002/pssc.201001030

关键词

shallow donor; DX properties; electron paramagnetic resonance

资金

  1. Swedish Energy Agency
  2. Swedish Foundation for Strategic Research
  3. Swedish Research Council
  4. Knut and Alice Wallenberg Foundation

向作者/读者索取更多资源

In unintentionally Si-doped AlN bulk samples, an electron paramagnetic resonance (EPR) spectrum with characteristics of a shallow donor, previously assigned to the shallow Si donor, was observed at room temperature in darkness. Temperature dependent studies of the EPR signal showed that Si is a DX center in AlN. However, with the negatively charged DX-state determined to be only similar to 78 meV below the neutral shallow donor state, Si should behave as a shallow dopant in AlN at normal device operating temperatures. (C) 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

3.8
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据