期刊
ATOMIC LAYER DEPOSITION APPLICATIONS 7
卷 41, 期 2, 页码 303-314出版社
ELECTROCHEMICAL SOC INC
DOI: 10.1149/1.3633681
关键词
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资金
- King Abdullah University of Science and Technology (KAUST) [KUS-C1-015-21]
- Swiss National Science Foundation [200020_125163]
- EU FP7 project ORION [NMP-229036]
- Natural Sciences and Engineering Research Council (NSERC) of Canada
- NSERC Solar Network
- NSERC
- Swiss National Science Foundation (SNF) [200020_125163] Funding Source: Swiss National Science Foundation (SNF)
Herein we present the latest fabrication and characterization techniques for atomic layer deposition of Al2O3, ZnO, SnO2, Nb2O5, HfO2, Ga2O3 and TiO2 for research on dye-sensitized solar cell. In particular, we review the fabrication of state-of-the-art 3D host-passivation-guest photoanodes and ZnO nanowires as well as characterize the deposited thin films using spectroscopic ellipsometry, X-ray diffraction, Hall effect, J-V curves and electrochemical impedance spectroscopy.
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