期刊
GALLIUM NITRIDE AND SILICON CARBIDE POWER TECHNOLOGIES
卷 41, 期 8, 页码 101-112出版社
ELECTROCHEMICAL SOC INC
DOI: 10.1149/1.3631489
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This work provides an overview of our GaN-on-Si activity for high voltage applications. We will discuss the failure mechanisms of GaN-on-Si devices by electrical characterization and TCAD simulations. The main issues of the use of the Si as substrate are identified and addressed. A breakdown voltage as high as 1050 V and a specific on-resistance as low as 2 mOhm.cm(2) have been achieved.
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