相关参考文献
注意：仅列出部分参考文献，下载原文获取全部文献信息。Numerical study on the shrinkage behavior of SU-8 patterns
Zhifu Yin et al.
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS (2017)
SU-8 hollow cantilevers for AFM cell adhesion studies
Vincent Martinez et al.
JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2016)
SU-8 microneedles based dry electrodes for Electroencephalogram
G. Stavrinidis et al.
MICROELECTRONIC ENGINEERING (2016)
Optical and EUV projection lithography: A computational view
Andreas Erdmann et al.
MICROELECTRONIC ENGINEERING (2015)
A simulation model on photoresist SU-8 thickness after development under partial exposure with reflection effect
Yuan-Te Huang et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2014)
Large scale three-dimensional simulations for thick SU-8 lithography process based on a full hash fast marching method
Zai-Fa Zhou et al.
MICROELECTRONIC ENGINEERING (2014)
A molecular dynamics investigation on the cross-linking and physical properties of epoxy-based materials
Lik-ho Tam et al.
RSC ADVANCES (2014)
Effects of temperature on mechanical properties of SU-8 photoresist material
Soonwan Chung et al.
JOURNAL OF MECHANICAL SCIENCE AND TECHNOLOGY (2013)
Study on diffraction effect and microstructure profile fabricated by one-step backside lithography
Wen-Cheng Yang et al.
JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2013)
Feature profile evolution during shallow trench isolation etching in chlorine-based plasmas. III. The effect of oxygen addition
Cheng-che Hsu et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2013)
Prism-assisted inclined UV lithography for 3D microstructure fabrication
Guomin Jiang et al.
JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2012)
Simulation of mechanical properties of epoxy-based chemically amplified resist by coarse-grained molecular dynamics
Hiromasa Yagyu et al.
POLYMER (2012)
Octree-based, GPU implementation of a continuous cellular automaton for the simulation of complex, evolving surfaces
N. Ferrando et al.
COMPUTER PHYSICS COMMUNICATIONS (2011)
An Efficient Simulation System for Inclined UV Lithography Processes of Thick SU-8 Photoresists
Zaifa Zhou et al.
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING (2011)
Design and fabrication of an ac-electro-osmosis micropump with 3D high-aspect-ratio electrodes using only SU-8
Hamza A. Rouabah et al.
JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2011)
Suspended SU-8 structures for monolithic microfluidic channels
Y. Moser et al.
MICROFLUIDICS AND NANOFLUIDICS (2011)
Embedded Microstructure Fabrication Using Developer-Permeability of Semi-Cross-Linked Negative Resist
Yoshikazu Hirai et al.
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS (2010)
UV-LIGA microfabrication of 220 GHz sheet beam amplifier gratings with SU-8 photoresists
Colin D. Joye et al.
JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2010)
Modeling and Simulations of Anisotropic Etching of Silicon in Alkaline Solutions with Experimental Verification
Zai-fa Zhou et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2009)
Fabrication of microlens arrays based on the mass transport effect of SU-8 photoresist using a multiexposure two-beam interference technique
Cheng Yi Wu et al.
APPLIED OPTICS (2009)
Analytical solution of the continuous cellular automaton for anisotropic etching
Miguel A. Gosalvez et al.
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS (2008)
Modeling, simulation and experimental verification of inclined UV lithography for SU-8 negative thick photoresists
Zhen Zhu et al.
JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2008)
Feature profile evolution during shallow trench isolation etch in chlorine-based plasmas. I. Feature scale modeling
John Hoang et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2008)
Application of inclined-exposure and thick film process for high aspect-ratio micro-structures on polymer optic devices
Kuo-Yung Hung et al.
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS (2008)
Improvement of the 2D dynamic CA method for photoresist etching simulation and its application to deep UV lithography simulations of SU-8 photoresists
Zai-Fa Zhou et al.
JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2007)
Multistencils fast marching methods: A highly accurate solution to the eikonal equation on Cartesian domains
M. Sabry Hassouna et al.
IEEE TRANSACTIONS ON PATTERN ANALYSIS AND MACHINE INTELLIGENCE (2007)
SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography
A. del Campo et al.
JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2007)
Simulation and analysis for microstructure profile of optical lithography based on SU-8 thick resist
Xionggui Tang et al.
MICROELECTRONIC ENGINEERING (2007)
A cellular automaton-based simulator for silicon anisotropic etching processes considering high index planes
Zai-fa Zhou et al.
JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2007)
Moving mask UV lithography for three-dimensional structuring
Yoshikazu Hirai et al.
JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2007)
A novel 3-D dynamic cellular automata model for photoresist-etching process simulation
Zai-Fa Zhou et al.
IEEE TRANSACTIONS ON COMPUTER-AIDED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS (2007)
Multidirectional UV lithography for complex 3-D MEMS structures
Yong-Kyu Yoon et al.
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS (2006)
Photothermally enabled lithography for refractive-index modulation in SU-8 photoresist
Biow Hiem Ong et al.
OPTICS LETTERS (2006)
Modeling dual inlaid feature construction
PJ Stout et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2006)
Novel exposure methods based on reflection and refraction effects in the field of SU-8 lithography
WJ Kang et al.
JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2006)
Improved inclined multi-lithography using water as exposure medium and its 3D mixing microchannel application
H Sato et al.
SENSORS AND ACTUATORS A-PHYSICAL (2006)
O(N) implementation of the fast marching algorithm
L Yatziv et al.
JOURNAL OF COMPUTATIONAL PHYSICS (2006)
Computational study of fast methods for the eikonal equation
PA Gremaud et al.
SIAM JOURNAL ON SCIENTIFIC COMPUTING (2006)
Electromagnetic phenomena in advanced photomasks
FM Schellenberg et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2005)
Functionalized SU-8 patterned with X-ray lithography
S Balslev et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2005)
A numerical and experimental study on gap compensation and wavelength selection in UV-lithography of ultra-high aspect ratio SU-8 microstructures
R Yang et al.
SENSORS AND ACTUATORS B-CHEMICAL (2005)
Comprehensive modeling of near-field nano-patterning
RC Rumpf et al.
OPTICS EXPRESS (2005)
Ultra-deep x-ray lithography of densely packed SU-8 features: II. Process performance as a function of dose, feature height and post exposure bake temperature
C Becnel et al.
JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2005)
Simulation of deep UV lithography with SU-8 resist by using 365 nm light source
X Tian et al.
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS (2005)
A novel 2D dynamic cellular automata model for photoresist etching process simulation
ZF Zhou et al.
JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2005)
Enhanced Dill exposure model for thick photoresist lithography
SJ Liu et al.
MICROELECTRONIC ENGINEERING (2005)
3D microfabrication with inclined/rotated UV lithography
M Han et al.
SENSORS AND ACTUATORS A-PHYSICAL (2004)
Application of 3D glycerol-compensated inclined-exposure technology to an integrated optical pick-up head
KY Hung et al.
JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2004)
METRO-3D: An efficient three-dimensional wafer inspection simulator for next-generation lithography
ZG Zhu et al.
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING (2004)
Influence of gate patterning on line edge roughness
LHA Leunissen et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2003)
Semiempirical profile simulation of aluminum etching in Cl2/BCl3 plasma
DJ Cooperberg et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS (2002)
Reduction of diffraction effect of UV exposure on SU-8 negative thick photoresist by air gap elimination
YJ Chuang et al.
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS (2002)
Using advanced simulation to aid microlithography development
DC Cole et al.
PROCEEDINGS OF THE IEEE (2001)
Some improvements of the fast marching method
DL Chopp
SIAM JOURNAL ON SCIENTIFIC COMPUTING (2001)
Evolution, implementation, and application of level set and fast marching methods for advancing fronts
JA Sethian
JOURNAL OF COMPUTATIONAL PHYSICS (2001)
A critical condition in Fresnel diffraction used for ultra-high resolution lithographic printing
AJ Bourdillon et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2000)
An efficient photoresist development simulator based on cellular automata with experimental verification
I Karafyllidis et al.
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING (2000)
Ion-assisted etching and profile development of silicon in molecular and atomic chlorine
JA Levinson et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2000)
Role of sidewall scattering in feature profile evolution during Cl-2 and HBr plasma etching of silicon
MA Vyvoda et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2000)
分享论文
