期刊
THIN SOLID FILMS
卷 660, 期 -, 页码 637-645出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2018.04.028
关键词
Plasma polymerization; Hexamethyldisiloxane; 316L stainless steel; Adhesion; Biocompatibility; Wear resistance
类别
资金
- Ministry of Science and Technology, Taiwan [MOST106-2221-E-182-021, MOST 106-2218-E-131-003, MOST105-2218-E-131-001]
- Chang Gung Memorial Hospital [CMRPD5H0021]
This study focused on the characterization of the organosilicon films deposited on 316L stainless steel (316L SS) substrate using a plasma polymerization process with hexamethyldisiloxane (HMDSO) precursor and different N-2 gas flow rates. The organosilicon film had a C-rich composition as deposited using only HMDSO precursor. The nitrogen content of thin film consecutively increased with increasing N-2 flow rate up to 15 sccm. The film deposition rate increased with increasing N-2 flow rate. All films exhibited the smooth and pinhole free surfaces. Good adhesion property was obtained for each film after scratch test. Better biocompatibility and cell adhesion was observed for the nitrogen free organosilicon film as compared with that of the untreated 316L SS. Further enhancement of biocompatibility was found for those films with N-2 addition. The best biocompatibility, highest transmittance, less hydrophobic surface, and excellent wear resistance were noted for the film grown under 5 sccm N-2 flow rate. Such film performance makes it become a promising candidate as the surface coating layer on 316L SS for biomedical application.
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