期刊
SURFACE & COATINGS TECHNOLOGY
卷 349, 期 -, 页码 959-962出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2018.06.087
关键词
Bias-enhanced nucleation; Tetramethylsilane; Diamond nuclei; Nucleation behavior; HRTEM
资金
- National Natural Science Foundation of China [51522229, 1120512]
- German Research Foundation (DGF) [JI 22/24-1]
This paper describes the effect of tetramethylsilane (TMS) on diamond nucleation on Si substrate under an applied bias voltage of 120 V, performed in a modified microwave plasma chemical vapor deposition (MPCVD) reactor. The introduction of TMS in the CH4/H-2 plasma leads to a significant enhancement of nucleation density of diamond nuclei, namely from (3.7 +/- 0.2) x 10(7)/cm(2) without the introduction of TMS to (4.7 +/- 0.5) x 10(10)/cm(2) at the TMS flow rate of 4 sccm. On the contrary, further increasing in the TMS flow rate to 8 sccm slightly reduces the nucleation density of diamond nuclei to (2.1 +/- 0.3) x 10(10)/cm(2), along with the increase in average size of diamond nuclei. High-resolution transmission electron microscopy (HRTEM) and Xray photoelectron spectroscopy (XPS) allow us to study the microstructural and chemical composition evolution of Si/diamond interface. The obtained results suggest that bias-enhanced nucleation of diamond on Si substrate exhibits a direct relationship with the TMS flow rate.
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