期刊
SURFACE & COATINGS TECHNOLOGY
卷 365, 期 -, 页码 2-9出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2018.04.013
关键词
Local structure; Magnetron sputtering; Ion bombardment; ZnO: Al; X-ray absorption spectroscopy
资金
- Open Project of State Key Laboratory of Advanced Technology for Float Glass [KF1601]
- National Key Research and Development Program [2016YFC1400605]
- Zhejiang Postdoctoral Preferential Foundation
Negative oxygen (O-) ions in the sputter deposition of oxides play a non-negligible role in determining their structures as well as physical properties. Knowledge of bombardment by O- ions induced local disorder in magnetron sputtered ZnO: Al (AZO) films is of fundamental interesting whereas that is currently limited. Here we report our initial results of the local structural changes characterized by a combination of Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and X-ray absorption spectroscopy (XAS). The bombardment conditions during the film deposition was varied through changing the discharge voltage (i.e., vertical bar V-d vertical bar = 80-220 V) and the substrate positions (i.e., center or erosion region of the target). We found that highly-energetic O- ions bombardment induced a coexistence of various point defects such as oxygen vacancies (V-O), oxygen interstitials (O-i), and zinc interstitials (Zn-i). The concentration of these defects and thus the local disorder can be noticeably reduced through decreasing the vertical bar V-d vertical bar down to a sufficient low level. These results can be used to further optimize the growth processes to achieve the ZnO-based and related thin films with a high structural order.
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