4.5 Article

High Optical Power Density Forward-Biased Silicon LEDs in Standard CMOS Process

期刊

IEEE PHOTONICS TECHNOLOGY LETTERS
卷 27, 期 2, 页码 121-124

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LPT.2014.2362983

关键词

Complementary metal-oxide-semiconductor (CMOS) process without any modification; forward-biased carrier-injection-type; optical power density; p(+)-n junction; silicon-based light-emitting devices (Si-LEDs)

资金

  1. National Natural Science Foundation of China [61474081, 61036002]

向作者/读者索取更多资源

This letter presents three low-operating-voltage silicon-based light-emitting devices (Si-LEDs) designed and made in a commercial standard 0.18-mu m CMOS process without any modification. The Si-LEDs with a new three-terminal and wedge-shaped forward-biased carrier-injection-type p(+)-n junction structure, have high optical powers. The output power increases by two orders of magnitude up to 1.78 mu W without saturation when the forward current is increased from 20 mA to 200 mA. The light-emitting area is the n-type drift region between the n(+) region and p(+) region. When the forward current increases to 200 mA, the optical power density exceeds 30 nW . mu m(-2) the power conversion efficiency and external quantum efficiency are similar to 2 x 10(-6) and 8.3 x 10(-6), respectively, higher than all other forward-biased Si-LEDs previously reported to have used CMOS processes without any modification.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.5
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据