期刊
PHYSICAL REVIEW LETTERS
卷 120, 期 2, 页码 -出版社
AMER PHYSICAL SOC
DOI: 10.1103/PhysRevLett.120.028002
关键词
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资金
- Center for Nanoscale Materials, U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences User Facilities [DE-AC02-06CH11357]
- Argonne's LDRD program
- Chicago MRSEC, under NSF [DMR-1420709]
Using high-resolution in situ small angle x-ray scattering in conjunction with oscillatory shear on highly monodisperse silica suspensions, we demonstrate that an order-to-disorder transition leads to a dynamic shear thickening in a lower stress regime than the standard steady shear thickening. We show that the order-to-disorder transition is controlled by strain, which is distinguishably different from steady shear thickening, which is a stress-related phenomenon. The appearance of this two-step shear thinning and thickening transition is also influenced by the particle size, monodispersity, and measurement conditions (i.e., oscillatory shear versus steady shear). Our results show definitively that the order-to-disorder transition-induced thickening is completely unrelated to the mechanism that drives steady shear thickening.
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