期刊
OPTICS EXPRESS
卷 26, 期 9, 页码 11649-11657出版社
OPTICAL SOC AMER
DOI: 10.1364/OE.26.011649
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资金
- Ministry of Trade, Industry Energy (MOTIE)
- Korea Semiconductor Research Consortium (KSRC) [10048720]
- National Research Foundation of Korea(NRF) [NRF-2015R1C1A1A01054652]
We propose a Fourier modal method (FMM) based through-focus scanning optical microscopy (TSOM) featuring sub-nano scale measurement tolerance. TSOM is very recently conceptualized non-destructive optical metrology technique just at the beginning stage of research. Nowadays the reliability and feasibility of TSOM concept is subject to controversy. We experimentally demonstrate stable nano-scale metrology of the FMM-based TSOM for the verification of the TSOM metrology and provide a numerical tool for true nano-meter scale TSOM through devising the FMM based TSOM scheme. By considering the illumination light parameters of incidence angle, polarization, degree of coherence, illumination numerical aperture, and collection numerical apertures in the FMM modeling of TSOM image acquisition, we reach precise agreement between the calculated and experimentally measured TSOM images. The essential elements of the FMM based TSOM for achieving high-level consistency are elucidated. (C) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
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