期刊
OPTICS AND LASERS IN ENGINEERING
卷 110, 期 -, 页码 179-185出版社
ELSEVIER SCI LTD
DOI: 10.1016/j.optlaseng.2018.06.001
关键词
Phase-error compensation; Gamma correction; Exponential fringe model; Phase measuring profilometry
类别
资金
- National Key R&D Program of China [2017YFF0106404]
- National Natural Science Foundation of China [51675160]
- Key Basic Research Project of Applied Basic Research Programs - Hebei Province [15961701D]
- Research Project for High-level Talents in Hebei University [GCC2014049]
- Talents Project Training Funds in Hebei Province [A201500503]
- Innovative and Entrepreneurial Talent Project - Jiangsu Province
- Joint Doctoral Training Foundation of HEBUT [2017GN0002]
- European Horizon 2020 through the Marie Sklodowska-Curie Individual Fellowship Scheme [707466-3DRM]
- UK's Engineering and Physical Sciences Research Council (EPSRC) [EP/P006930/1]
- EPSRC [EP/I033424/1, EP/P006930/1] Funding Source: UKRI
Phase measuring profilometry (PMP) is susceptible to phase error caused by gamma distortion that leads to the captured fringe patterns deviating from ideal sinusoidal waveforms. Existing phase-error compensation methods are generally complex and require significant computational resources for implementation. This paper proposes a generic exponential fringe model expressed as an exponential function of the generated fringe patterns. Based on this model, a straightforward gamma correction method is presented to alleviate phase error without the need for any estimation of nonlinear coefficients or complex calibration. Experimental results demonstrate that the proposed method improves the quality of measurements by suppressing phase error.
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