3.8 Proceedings Paper

Deposition of TiO2 Blocking layers of Photovoltaic cell Using RF Magnetron Sputtering technology

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ELSEVIER SCIENCE BV
DOI: 10.1016/j.egypro.2013.06.788

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Blocking layer; Dye-sensitized solar cells; RF magnetron sputtering; Nanoporous films; TiO2

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Dye-sensitized solar cells (DSCs) have used transparent conductive Fluorine-doped SnO2 (FTO) glass/porous TiO2 layer attached using dye molecules/electrolytes (I-/I-3-)/Pt-coated FTO glass configuration. In this work, prior to the coating of nanoporous TiO2 layer on FTO glass, a dense layer of TiO2 less than similar to 100nm in thickness as an electron blocking layer was deposited directly onto the FTO using radio frequency (RF) magnetron sputtering technology. Under 100 mW/cm(2) illumination at AM 1.5, the energy conversion efficiency (eta) of the prepared DSC with electron blocking layer of 60nm thickness was 6.77% (V-oc = 0.715 V, J(sc) = 12.932 mA/cm(2), ff = 0.74), which is increased by 1.27% compared to the general cell without electron blocking layer. (C) 2013 The Authors. Published by Elsevier B.V.

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