4.6 Article

Microstructural Investigation of CoCrFeMnNi High Entropy Alloy Oxynitride Films Prepared by Sputtering Using an Air Gas

期刊

METALS AND MATERIALS INTERNATIONAL
卷 24, 期 6, 页码 1285-1292

出版社

KOREAN INST METALS MATERIALS
DOI: 10.1007/s12540-018-0143-2

关键词

High entropy alloy; Microstructure; Oxynitride; Oxide; Nitride; CoCrFeMnNi

资金

  1. Chungnam National University [2016-1346-01]
  2. National Research Foundation of Korea [2016M3D1A1023534] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

向作者/读者索取更多资源

Microstructural properties of as-grown and annealed CoCrFeMnNi high entropy alloy (HEA) oxynitride thin films were investigated. The CoCrFeMnNi HEA oxynitride thin film was grown by magnetron sputtering method using an air gas, and annealed under the argon plus air flow for 5h at 800 degrees C. The as-grown film was homogeneous and uniform composed of nanometer-sized crystalline regions mixed with amorphous-like phase. The crystalline phase in the as-grown film was face centered cubic structure with the lattice constant of 0.4242nm. Significant microstructural changes were observed after the annealing process. First, it was fully recrystallized and grain growth happened. Second, Ni-rich region was observed in nanometer-scale range. Third, phase change happened and it was determined to be Fe3O4 spinel structure with the lattice constant of 0.8326nm. Hardness and Young's modulus of the as-grown film were 4.1 and 150.5GPa, while those were 9.4 and 156.4GPa for the annealed film, respectively.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据