期刊
MATERIALS LETTERS
卷 216, 期 -, 页码 20-23出版社
ELSEVIER
DOI: 10.1016/j.matlet.2017.12.094
关键词
Cu nanoaggregates; Nanoparticles; Sintering; Resistivity; Cu film
资金
- National Basic Research Program of China [2015CB057205]
- Program for Changjiang Scholars and Innovative Research Team in University [IRT_17R44]
In this paper, we have developed a new type of Cu nanoaggregates, which were agglomerated by 5 nm Cu nanoparticles. The nanoaggregates can be well sintered at very low temperature, and an excellent resistivity of 4.37 mu Omega cm was achieved after sintering at 250 degrees C, which is only 2.5 times larger than that of Cu bulk. A novel mechanism has been put forward to elucidate the sintering behavior for the Cu nanoaggregates. With the advantage of high sintering performance, this type of Cu nanoaggregates is promising to be widely used in various fields, such as printed electronics and microelectronic packaging. (C) 2017 Elsevier B.V. All rights reserved.
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