期刊
MACROMOLECULAR MATERIALS AND ENGINEERING
卷 303, 期 6, 页码 -出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/mame.201700654
关键词
EUV; lithography; molecular glasses; photoresists
资金
- National Natural Science Foundation of China (NSFC) [21373240, 91623105, 21233011]
- National Science and Technology Major Project [2011ZX02701]
Novel molecular glasses (MGs) containing bisphenol A backbone (BPA-6 and BPA-10) are synthesized and characterized. BPA-6 and BAP-10 are excellent amorphous materials for extreme ultraviolet (EUV) patterning applications with good thermal stability (T-d more than 160 degrees C). The MGs can be used as positive-tone photoresists combined with triphenylsulfonium perfluoro-1-butanesulfonate and trioctylamine dissolved in propylene glycol monomethyl ether acetate. High-resolution feature sizes as small as 23.1 nm with extremely low line edge roughness (less than 2 nm), high sensitivity (less than 20 mJ cm(-2)), and good high aspect ratio patterns are obtained by using EUV lithography.
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