Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography

Novel molecular glasses (MGs) containing bisphenol A backbone (BPA-6 and BPA-10) are synthesized and characterized. BPA-6 and BAP-10 are excellent amorphous materials for extreme ultraviolet (EUV) patterning applications with good thermal stability (T-d more than 160 degrees C). The MGs can be used as positive-tone photoresists combined with triphenylsulfonium perfluoro-1-butanesulfonate and trioctylamine dissolved in propylene glycol monomethyl ether acetate. High-resolution feature sizes as small as 23.1 nm with extremely low line edge roughness (less than 2 nm), high sensitivity (less than 20 mJ cm(-2)), and good high aspect ratio patterns are obtained by using EUV lithography.