Universal Grating Coupler Design

A universal design methodology for grating couplers based on the silicon-on-insulator platform is presented in this paper. Our design methodology accommodates various etch depths, silicon thicknesses (e.g., 220 nm, 300 nm), incident angles, and cladding materials (e.g., silicon oxide or air), and has been verified by simulations and measurement results. Further more, the design methodology presented can be applied to a wide range, from 1260 nm to 1675 nm, of wavelengths.