期刊
JOURNAL OF APPLIED ELECTROCHEMISTRY
卷 48, 期 7, 页码 827-834出版社
SPRINGER
DOI: 10.1007/s10800-018-1204-4
关键词
Galvanic deposition; Ionic liquid; Aluminum nano-layer
资金
- National Natural Science Foundation of China [11404295]
- National Key Scientific Apparatus Development of Special Item of China [2012YQ130125]
- Disipline Development Foundation of China Academy of Engineering and Physics [2015B0301065]
Aluminum (Al) coatings, which are found to be dendrites, have been deposited on uranium (U) substrate in ionic liquid via galvanic displacement. Interestingly, a dense Al nano-layer has formed between the Al dendrites and the U substrate. In this work, the growth mechanism of the Al coating has been investigated by ultraviolet-visible spectroscopy, scanning electron microscopy, grazing incidence X-ray diffraction, and electrochemical measurements: the galvanic reaction sees the oxidation of U from the substrate while Al2Cl7 (-) are reduced on its surface, driven by the electrochemical potential difference between Al and U. Furthermore, we have found that the Al nano-layer passivates the uranium surface, which is proved to be the rate limiting step in the galvanic deposition process; the observation of the interface morphology evolution process indicates that this Al nano-layer grows in a three-dimensional mode. This work demonstrates a convenient approach to deposit dense Al nano-layer on U, without any external power source. [GRAPHICS] .
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