期刊
JAPANESE JOURNAL OF APPLIED PHYSICS
卷 57, 期 5, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.7567/JJAP.57.05GC01
关键词
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资金
- National Research Foundation of Korea - Korean Government (Ministry of Science, ICT and Future Planning) [NRF-2016R1A2B4016361]
Interface between the channel and the gate dielectric of organic thin film transistors (OTFTs) needs to be smoothed in order to improve the electrical characteristics. In this study, an optimized calendering process was proposed to improve the surface roughness of the channel. Top-gate, bottom-contact structural p-type OTFT samples were fabricated using roll-to-roll gravure printing (source/drain, channel), spin coating (gate dielectric), and inkjet printing (gate electrode). The calendering process was optimized using the grey-based Taguchi method. The channel surface roughness and electrical characteristics of calendered and non-calendered samples were measured and compared. As a result, the average improvement in the surface roughness of the calendered samples was 26.61%. The average on-off ratio and field-effect mobility of the calendered samples were 3.574 x 10(4) and 0.1113 cm(2)V(-1) s(-1), respectively, which correspond to the improvements of 16.72 and 10.20%, respectively. (C) 2018 The Japan Society of Applied Physics
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