期刊
SURFACE SCIENCE SPECTRA
卷 21, 期 1, 页码 68-83出版社
AMER INST PHYSICS
DOI: 10.1116/11.20140702
关键词
gas cluster source; depth profile; XPS; argon cluster; preferential sputtering; tantalum pentoxide; Ta2O5; MAGCIS
资金
- EPRSC
- University of Surrey
A standard 30 nm thick Ta2O5 oxide layer grown on Ta was examined by XPS after Ar-n(+) cluster ion bombardment at ion energies of 4 keV, 5 keV and 6 keV, with a cluster size of 1000 atoms. The reduction of Ta2O5, resulting from the preferential sputtering of oxygen after ion beam bombardment at different energies has been investigated. Survey spectra, C 1s, Ta 4f and O 1s spectra are presented for each profile at three stages: native surface, after reaching the steady-state oxide composition, and from the underlying metal substrate. It is necessary to reach a voltage of 6 keV to obtain a good sputter rate. The use of the cluster source seems to be promising to reduce the preferential sputtering phenomenon. (C) 2014 American Vacuum Society.
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