Impact of resist shrinkage on the template release process in nanoimprint lithography

Template release in nanoimprint lithography was computationally studied. The impact of resist shrinkage on template release load is described. The resist shrinkage affects the state of the boundary status between resist and template, and is a factor that influences whether the resist adheres to or separates from the template. When the resist fully adheres to the template, the release load increases due to residual stress as the residual layer becomes thinner. This is because compressive stress at the residual layer is induced by resist shrinkage in the pattern cavity. In addition, the release load increases when the resist partially adheres to the template, a consequence of the decrease in interfacial area. This is because the decrement of interface area due to concentration of stress. (C) 2014 American Vacuum Society.