4.5 Article

Residual thermal stress of SiC/Ti3SiC2/SiC joints calculation and relaxed by postannealing

期刊

出版社

WILEY
DOI: 10.1111/ijac.12900

关键词

finite element analysis; Raman spectra; SiC joining; thermal mismatch stress

资金

  1. Natural Science Foundation of Zhejiang Province [LY15E020007]
  2. National Natural Science Foundation of China [51502310, 91226202, 91426304]
  3. Strategic Priority Research Program of Chinese Academy of Sciences [XDA03010305]
  4. National Key Research and Development Program of China [2016YFB0700100]

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Residual thermal stresses in SiC/Ti3SiC2/SiC joining couples were calculated by Raman spectra and simulated by finite element analysis, and then relaxed successfully by postannealing. The results showed that the thermal residual stress between Ti3SiC2 and SiC was about on the order of 1 GPa when cooling from 1300 degrees C to 25 degrees C. The thermal residual stresses can be relaxed by the recovery of structure disorders during postannealing. When the SiC/Ti3SiC2/SiC joints postannealed at 900 degrees C, the bending strength reached 156.9 +/- 13.5 MPa, which was almost twice of the as-obtained SiC/Ti3SiC2/SiC joints. Furthermore, the failure occurred at the SiC matrix suggested that both the flexural strength of joining layer and interface were higher than the SiC matrix.

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