4.4 Article Proceedings Paper

Nanopore Fabrication of Two-Dimensional Materials on SiO2 Membranes Using He Ion Microscopy

期刊

IEEE TRANSACTIONS ON NANOTECHNOLOGY
卷 17, 期 4, 页码 727-730

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TNANO.2018.2840721

关键词

2D material; boron nitride; graphene; He ion microscopy; MoS2; nanopore

资金

  1. Japan Society for the Promotion of Science [JP16H03841, JP17K14099]
  2. Japan Science and Technology Agency Nanotech Career-up Alliance
  3. Murata Science Foundation
  4. MEXT Nanotechnology Platform in Osaka University
  5. Kyoto University

向作者/读者索取更多资源

Structures with pores having diameters of several nanometers can be used for distinguishing nucleotides in DNA. A 2-D material such as a thin membrane is expected to enhance precise molecule recognition. Here, we present the nanopore fabrication to thin 2-D membranes using He ion microscopy (HIM). We transferred three 2-D materials, chemical vapor deposition (CVD) graphene, CVD boron nitride, and peel-off MoS2, to the submicrometer pore of freestanding SiO2 membranes on a silicon substrate. The number of atomic layers of the 2-D materials was confirmed via Raman spectroscopy and X-ray photoelectron spectroscopy. We examined the reproducibility and accuracy of nanopore fabrication as a function of the focal position and beam irradiation intensity of the HIM system. Reproducible nanopores having diameters of less than 10 nm were realized by optimizing the intensity and focal position. We achieved 1.5-nm-diameter nanopores in a single layer of graphene using this HIM technique.

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