4.6 Article

Proton Radiation Effects on Y-Doped HfO2-Based Ferroelectric Memory

期刊

IEEE ELECTRON DEVICE LETTERS
卷 39, 期 6, 页码 823-826

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2018.2831784

关键词

HfO2; ferroelectric memory; radiation; proton

资金

  1. National High Technology Research Development Program [2017YFB0405600, 2016YFA0201803]
  2. National Natural Science Foundation of China [61521064, 61732020, 61474136, 61574166, 61522408, 61475031, 51522204]
  3. Austrian-Chinese Cooperative RD Projects [172511KYSB20150006]

向作者/读者索取更多资源

In this letter, ferroelectric memory performance of TiN/Y-doped-HfO2 (HYO)/TiN capacitors is investigated under proton radiation with 3-MeV energy and different fluence (5e13, 1e14, 5e14, and 1e15 ions/cm(2)). X-ray diffraction patterns confirm that the orthorhombic phase Pbc(21) of HYO film has no obvious change after proton radiation. Electrical characterization results demonstrate slight variations of the permittivity and ferroelectric hysteresis loop after proton radiation. The remanent polarization (2P(r)) of the capacitor decreases with increasing proton fluence. But the decreasing trend of 2P(r) is suppressed under high electric fields. Furthermore, the 2P(r) degradation with cycling is abated by proton radiation. These results show that the HYO-based ferroelectric memory is highly resistive to proton radiation, which is potentially useful for space applications.

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