期刊
CERAMICS INTERNATIONAL
卷 44, 期 3, 页码 3122-3127出版社
ELSEVIER SCI LTD
DOI: 10.1016/j.ceramint.2017.11.079
关键词
Si-doped Ga2O3 films; MOCVD; Conductivity; Photoluminescence
资金
- National Natural Science Foundation of China [61774072, 61376046, 61674068, 61404070]
- Science and Technology Developing Project of Jilin Province [20170204045GX, 20150519004JH, 20160101309JC]
- National Key Research and Development Program [2016YFB0401801]
- Program for New Century Excellent Talents in University [NCET-13-0254]
Heteroepitaxial growth of conductive Si-doped beta-Ga2O3 films on c-plane sapphire substrates by metal-organic chemical vapor deposition (MOCVD) was successfully performed. The effect of Si content on the structural, morphological, electrical and optical properties of Si-doped beta-Ga2O3 films was investigated in detail. Distinctive surface morphology evolution of films depending on Si content was observed and presented. The Si-doped beta-Ga2O3 films exhibited high transmittance in the ultraviolet-visible regions. The temperature-dependent PL was carried out especially to discuss the photoluminescence properties of Si-doped beta-Ga2O3 films. More importantly, the results suggested that the conductivity of heteroepitaxial Si-doped beta-Ga2O3 films by MOCVD could be realized and controlled by adjusting the Si content. The minimum resistivity of 1.79 x 10(-1) Omega.cm was obtained for the films grown under the SiH4 flow rate of 0.08 sccm.
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