期刊
APPLIED PHYSICS LETTERS
卷 113, 期 1, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.5038189
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资金
- JSPS KAKENHI [JP17H05331]
- Council for Science, Technology and Innovation (CSTI)
- NEDO
An in-situ X-ray topography system using monochromatic synchrotron radiation for the observation of the stacking faults in 4H-SiC during a high-temperature annealing process was developed. We demonstrated that the stacking faults in nitrogen-doped 4H-SiC not only expand but also shrink at high temperatures. Furthermore, it was confirmed that the types of the core structure of partial dislocations enclosing the stacking fault can be determined at high temperatures. Published by AIP Publishing.
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