期刊
ACS APPLIED MATERIALS & INTERFACES
卷 10, 期 31, 页码 26501-26509出版社
AMER CHEMICAL SOC
DOI: 10.1021/acsami.8b06538
关键词
nanopatterning; solution process; printing; selective wetting; plasmonic filter
资金
- Center for Advanced Soft Electronics [CASE-2013M3A6A5073175]
- Center for Advanced Meta-Materials [CAMM-2014M3A6B3063707]
- Nano Material Technology Development Program - Ministry of Science, ICT, and Future Planning [NRF-2016M3A7B4910631]
Nanopatterns of functional materials have successfully led innovations in a wide range of fields, but further exploration of their full potential has often been limited because of complex and cost-inefficient patterning processes. We here propose an additive nanopatterning process of functional materials from solution route using selective wetting phenomenon. The proposed process can produce nanopatterns as narrow as 150 nm with high yield over large area at ultrahigh process speed, that is, the speed of solution dragging, of up to ca. 4.6 m.min(-1). The process is highly versatile that it can utilize a wide range of solution materials, control vertical structures including pattern thickness and multistacks, and produce nanopatterns on various substrates with emerging form factors such as foldability and disposability. The solution patterning in nanoscale by selective wetting is enabled by corresponding surface energy patterns in high contrast that are achieved by one-step imprinting onto hydrophobic/hydrophilic bilayers. The mechanisms and control parameters for the solution patterning are revealed by fluid-dynamic simulation. With the aforementioned advantages, we demonstrate 25 400 pixel-per-inch light-emitting pixel arrays and a plasmonic color filter of 10 cm x 10 cm area on a plastic substrate as potential applications.
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