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Effect of atomic layer deposited ultra thin HfO2 and Al2O3 interfacial layers on the performance of dye sensitized solar cells
Mariyappan Shanmugam et al.
THIN SOLID FILMS (2010)
Al2O3/ZrO2 Nanolaminates as Ultrahigh Gas-Diffusion Barriers-A Strategy for Reliable Encapsulation of Organic Electronics
Jens Meyer et al.
ADVANCED MATERIALS (2009)
Atomic layer deposition and biocompatibility of titanium nitride nano-coatings on cellulose fiber substrates
G. K. Hyde et al.
BIOMEDICAL MATERIALS (2009)
Gas diffusion ultrabarriers on polymer substrates using Al2O3 atomic layer deposition and SiN plasma-enhanced chemical vapor deposition
P. F. Carcia et al.
JOURNAL OF APPLIED PHYSICS (2009)
Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
Nicholas G. Kubala et al.
JOURNAL OF PHYSICAL CHEMISTRY C (2009)
Organometal Halide Perovskites as Visible-Light Sensitizers for Photovoltaic Cells
Akihiro Kojima et al.
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY (2009)
Copper Oxide Films Grown by Atomic Layer Deposition from Bis(tri-n-butylphosphane)copper(I)acetylacetonate on Ta, TaN, Ru, and SiO2
Thomas Waechtler et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2009)
Interfacial energy levels and related properties of atomic-layer-deposited Al2O3 films on nanoporous TiO2 electrodes of dye-sensitized solar cells
Ta-Chang Tien et al.
NANOTECHNOLOGY (2009)
Thin-film encapsulation of polymer-based bulk-heterojunction photovoltaic cells by atomic layer deposition
Chih-Yu Chang et al.
ORGANIC ELECTRONICS (2009)
An inverted organic solar cell employing a sol-gel derived ZnO electron selective layer and thermal evaporated MoO3 hole selective layer
A. K. K. Kyaw et al.
APPLIED PHYSICS LETTERS (2008)
Molecular layer deposition of alucone polymer films using trimethylaluminum and ethylene glycol
A. A. Dameron et al.
CHEMISTRY OF MATERIALS (2008)
Thin MnO and NiO films grown using atomic layer deposition from ethylcyclopentadienyl type of precursors
H. L. Lu et al.
JOURNAL OF CRYSTAL GROWTH (2008)
Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition
Qi Xie et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2008)
Enhancement in dye-sensitized solar cells based on MgO-coated TiO2 electrodes by reactive DC magnetron sputtering
Sujuan Wu et al.
NANOTECHNOLOGY (2008)
Atomic layer deposition of TiO2 from tetrakis-dimethyl-amido titanium or Ti isopropoxide precursors and H2O
Qi Xie et al.
JOURNAL OF APPLIED PHYSICS (2007)
Atomic layer deposition and characterization of Ga-doped ZnO thin films
K. Saito et al.
SUPERLATTICES AND MICROSTRUCTURES (2007)
Atomic layer deposition of Zn1-xMgxO buffer layers for Cu(In,Ga)Se2 solar cells
T. Toerndahl et al.
PROGRESS IN PHOTOVOLTAICS (2007)
Impedance spectroscopy characterization of resistance switching NiO thin films prepared through atomic layer deposition
Yil-Hwan You et al.
APPLIED PHYSICS LETTERS (2006)
Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
E. Langereis et al.
APPLIED PHYSICS LETTERS (2006)
Zn(O,S) buffer layers by atomic layer deposition in Cu(In,Ga)Se2 based thin film solar cells:: Band alignment and sulfur gradient
C. Platzer-Bjorkman et al.
JOURNAL OF APPLIED PHYSICS (2006)
Atomic layer deposition of ultrathin copper metal films from a liquid copper(I) amidinate precursor
Zhengwen Li et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2006)
Nucleation and growth during Al2O3 atomic layer deposition on polymers
CA Wilson et al.
CHEMISTRY OF MATERIALS (2005)
Atomic layer deposition of nickel oxide films using Ni(dmamp)2 and water
TS Yang et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2005)
Advanced electronic and optoelectronic materials by Atomic Layer Deposition:: An overview with special emphasis on recent progress in processing of high-k dielectrics and other oxide materials
L Niinistö et al.
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE (2004)
Control of charge recombination dynamics in dye sensitized solar cells by the use of conformally deposited metal oxide blocking layers
E Palomares et al.
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY (2003)
Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing
H Kim
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2003)
Atomic layer deposition (ALD):: from precursors to thin film structures
M Leskelä et al.
THIN SOLID FILMS (2002)
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