期刊
OPEN PHYSICS
卷 15, 期 1, 页码 1067-1071出版社
DE GRUYTER POLAND SP ZOO
DOI: 10.1515/phys-2017-0137
关键词
photovoltaic; silicon solar cell; atomic layer deposition; antireflection coating
资金
- Faculty of Mechanical Engineering of the Silesian University of Technology
This paper presents the results of study on titanium dioxide thin films prepared by atomic layer deposition method on a silicon substrate. The changes of surface morphology have been observed in topographic images performed with the atomic force microscope (AFM) and scanning electron microscope (SEM). Obtained roughness parameters have been calculated with XEI Park Systems software. Qualitative studies of chemical compositionwere also performed using the energy dispersive spectrometer (EDS). The structure of titanium dioxide was investigated by X-ray crystallography. A variety of crystalline TiO2 was also confirmed by using the Raman spectrometer. The optical reflection spectra have been measured with UV-Vis spectrophotometry.
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