Direct fabrication of C12A7 electride target and room temperature deposition of thin films with low work function

In this work, a high density (94%) and high electron concentration (2.3 x 1020 cm(-3)) doped C12A7 electride ceramic target for magnetron sputtering was prepared by directly heating the C12A7 nano powder to above its melting point. The effects of the temperature on the electron concentration was explored. Furthermore, a smooth (R-q = 0.6 nm), high transparent and low work function (Phi = 2.9 eV) C12A7 electride thin film was deposited via magnetron sputtering. This result provides a suitable route for the fabrication of large-scale C12A7 electride film and has a bright prospect for application in optoelectronic devices.