4.7 Article

Size effect of the active sites in UiO-66-supported nickel catalysts synthesized via atomic layer deposition for ethylene hydrogenation

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INORGANIC CHEMISTRY FRONTIERS
卷 4, 期 5, 页码 820-824

出版社

ROYAL SOC CHEMISTRY
DOI: 10.1039/c7qi00056a

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资金

  1. DOE, Office of Science, Basic Energy Sciences [DE-SC0012702]
  2. Department of Defense (DoD) through the National Defense Science and Engineering Fellowship (NDSEG) program
  3. MRSEC program of the National Science Foundation at the Materials Research Center of Northwestern University [DMR-1121262]
  4. MRSEC program at the Materials Research Center [NSF DMR-1121262]
  5. International Institute for Nanotechnology (IIN)
  6. State of Illinois, through the IIN
  7. National Institutes of Health under NIH [1S10OD012016-01/1S10RR019071-01A1]

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Ni(II) ions have been deposited on the Zr-6 nodes of a metal-organic framework (MOF), UiO-66, via an ALD-like process (ALD = atomic layer deposition). By varying the number of ALD cycles, three Ni-decorated UiO-66 materials were synthesized. A suite of physical methods has been used to characterize these materials, indicating structural and high-surface-area features of the parent MOF are retained. Elemental analysis via X-ray photoelectron spectroscopy (XPS) indicates that the anchored Ni ions are mainly on surface and near-surface MOF defect sites. Upon activation, all three materials are catalytic for ethylene hydrogenation, but their catalytic activities significantly vary, with the largest clusters displaying the highest per-nickel-atom activity. The study highlights the ease and effectiveness of ALD in MOFs (AIM) for synthesizing, specifically, UiO-66-supported NiyOx catalysts.

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