4.7 Article

Adsorption-controlled growth of La-doped BaSnO3 by molecular-beam epitaxy

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APL MATERIALS
卷 5, 期 11, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.5001839

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资金

  1. Air Force Office of Scientific Research [FA9550-16-1-0192]
  2. National Science Foundation [Platform for the Accelerated Realization, Analysis, and Discovery of Interface Materials (PARADIM)] [DMR-1539918]
  3. Center for Low Energy Systems Technology (LEAST), one of the six SRC STARnet Centers - MARCO
  4. Center for Low Energy Systems Technology (LEAST), one of the six SRC STARnet Centers - DARPA
  5. NSF MRSEC program [DMR-1719875]
  6. NSF [ECCS-15420819]
  7. Direct For Mathematical & Physical Scien
  8. Division Of Materials Research [1539918] Funding Source: National Science Foundation

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Epitaxial La-doped BaSnO3 films were grown in an adsorption-controlled regime by molecular-beam epitaxy, where the excess volatile SnOx desorbs from the film surface. A film grown on a (001) DyScO3 substrate exhibited a mobility of 183 cm(2) V-1 s(-1) at room temperature and 400 cm(2) V-1 s(-1) at 10 K despite the high concentration (1.2 x 10(11) cm(-2)) of threading dislocations present. In comparison to other reports, we observe a much lower concentration of (BaO)(2) Ruddlesden-Popper crystallographic shear faults. This suggests that in addition to threading dislocations, other defects-possibly (BaO)(2) crystallographic shear defects or point defects-significantly reduce the electron mobility. (C) 2017 Author(s).

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