Exploration into Sputtered Indium Tin Oxide Film Properties as a Function of Magnetic Field Strength

Depositing high-performing indium tin oxide (ITO) films onto room temperature substrates has been an industry-wide challenge for decades. Identifying the process properties that drive film quality is the first key to developing advanced hardware capable of improving ITO film properties. The room-temperature ITO deposition process space and resulting film properties as a function of magnetic field strength are explored in this study to help determine the key mechanisms responsible for changing the ITO film properties.