期刊
JOURNAL OF MATERIALS CHEMISTRY C
卷 5, 期 32, 页码 8301-8307出版社
ROYAL SOC CHEMISTRY
DOI: 10.1039/c7tc02775c
关键词
-
资金
- European Research Council under the European Union's Seventh Framework Programme (FP)/ERC Grant [337328]
- Philips
- AMOLF
- Netherlands Organization for Scientific Research (NWO) [12754]
Halide perovskites have recently gained widespread attention for their high efficiencies in photovoltaics, and they have also been studied for applications in light emission. Both of these fields can benefit from nanophotonic patterning. Here, by controlling the crystallization of the perovskite film in contact with a nanotextured silicone polymer stamp, nanostructures are reproduced in the perovskite. Soft lithography techniques such as this imprinting are particularly useful for halide perovskites, which are incompatible with the aqueous solutions and plasmas used in conventional patterning processes. Additionally, soft lithography can pattern over defects and avoids damaging the master. By extending nanoscale soft lithography to halide perovskites, new opportunities arise in merging nanophotonics with these remarkable materials.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据