期刊
CHEMICAL COMMUNICATIONS
卷 53, 期 10, 页码 1634-1637出版社
ROYAL SOC CHEMISTRY
DOI: 10.1039/c6cc08738h
关键词
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资金
- National Science Council of the Republic of China [MOST 104-2221-E-244-005]
This research presents a triple-layer transparent conductive oxide thin film, with a lithium-doped nickel oxide/silver/lithium-doped nickel oxide (L-NiO/Ag/L-NiO) structure using radio-frequency (RF) magnetron sputtering on glass substrates. The high transmittance L-NiO thin films were deposited using the sputtering method with Ar/H-2 as the reaction gases. The triple-layer structure, L-NiO/Ag/L-NiO, showed impressive electrical conductivity. The figure of merit (FOM) results indicated that the L-NiO/Ag/L-NiO triple-layer thin films with Ag deposition times of 2 min possessed satisfactory optical and electrical properties for potential applications.
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