期刊
ADVANCED ENGINEERING MATERIALS
卷 19, 期 6, 页码 -出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adem.201600819
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资金
- SABIC Global Technologies B.V. [G01140407]
- Institute for Information & communications Technology Promotion (IITP) - Korea government (MSIP) [B0101-16-0133]
- Institute for Information & Communication Technology Planning & Evaluation (IITP), Republic of Korea [B0101-16-0133] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
A single-chamber system capable of depositing both organic and inorganic layers by initiated chemical vapor deposition (iCVD) and atomic layer deposition (ALD) is demonstrated to facilitate the fabrication of organic/inorganic hybrid thin film encapsulation (TFE). The chamber geometry and the process conditions of iCVD and ALD are similar to each other, which enabled the design of the single-chamber system. Both organic and inorganic films deposited via the single-chamber system produces films with their properties equivalent to those deposited in separate iCVD and ALD reactors. Alternating the deposition mode between iCVD and ALD produces organic/inorganic multilayers with outstanding barrier properties as well as optical transparency mechanical flexibility.
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