期刊
RSC ADVANCES
卷 7, 期 88, 页码 55750-55755出版社
ROYAL SOC CHEMISTRY
DOI: 10.1039/c7ra11291b
关键词
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资金
- Supercomputing Center/Korea Institute of Science and Technology Information with supercomputing resources [KSC-2016-C3-0020]
- joint program for Samsung Electronics Co., Ltd. (SEC)
- Brain Korea 21 Plus project for SNU Materials Division for Educating Creative Global Leaders [F15SN02D1702]
- National Research Foundation of Korea (NRF) - Korea government [RIAM NRF-2016R1D1A1A02937045]
In the fabrication process of memory devices, a void-free tungsten (W) gate process with good conformability is very important for improving the conductivity of the W gate, leading to enhancement of device performance. As the downscaling continues to progress, void-free W deposition becomes more difficult due to the experimental limitations of conformal film deposition even with atomic layer deposition (ALD) W processes. In ALD W processes, it is known that the B2H6 dosing process plays a key role in deposition of the ALD W layer with low resistivity and in removal of residual fluorine (F) atoms. To comprehend the detailed ALD W process, we have investigated the dissociation reaction of B2H6 on three different TiN surfaces, TiN (001), Ti-terminated TiN (111), and N-terminated TiN (111), using first-principles density functional theory (DFT) calculations. N-terminated TiN (111) shows the lowest overall reaction energy for B2H6. These results imply that severe problems, such as a seam or void, in filling the W metal gate for memory devices could be attributed to the difference in the deposition rate of W films on TiN surfaces. From this study, it was found that the control of the texture of the TiN film is essential for improving the subsequent W nucleation.
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