4.6 Article

Flux growth and characterization of an FeSi4P4 single crystal

期刊

RSC ADVANCES
卷 7, 期 76, 页码 47938-47944

出版社

ROYAL SOC CHEMISTRY
DOI: 10.1039/c7ra08118a

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资金

  1. National Natural Science Foundation of China [51572155, 51321091]
  2. National Key Research and Development Program of China [2016YFB1102201]
  3. Shandong Provincial Natural Science Foundation, China [ZR2014EMM015]
  4. Independent Innovation Foundation of Shandong University, IIFSDU

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Herein, a single crystal of FeSi4P4 (FSP) with dimensions up to 8 x 7 x 3 mm(3) was successfully grown using a seeded flux growth method. Single crystal X-ray diffraction results revealed that the FSP crystal crystallized in the chiral space group P1 (no. 1). High-resolution X-ray diffraction presents a full-width at half-maximum (FWHM) of 36 '' and 46 '' for the (100) and (001) FSP crystals, respectively, which indicates that FSP crystals have high crystalline quality. FSP is thermally stable up to 1157.1 degrees C and has a high thermal conductivity of 35 W (m K)(-1) at room temperature. The magnetic analysis shows that the FSP crystal is paramagnetic in the range from 5 to 300 K. The Hall effect measurement suggests that the FSP crystal is a promising p-type semiconductor at room temperature.

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