4.7 Article

Thickness-dependent a1/a2 domain evolution in ferroelectric PbTiO3 films

期刊

ACTA MATERIALIA
卷 131, 期 -, 页码 123-130

出版社

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.actamat.2017.03.064

关键词

Ferroelectric; PbTiO3; a(1)/a(2) domain structure; Transmission electron microscopy

资金

  1. National Natural Science Foundation of China [51571197, 51231007, 51501194, 51671194]
  2. National Basic Research Program of China [2014CB921002]
  3. Key Research Program of Frontier Sciences CAS [QYZDJ-SSW-JSC010]
  4. IMR SYNL-T.S. Ke Research Fellowship

向作者/读者索取更多资源

Ferroelectric a(1)/a(2) domain structure has great potentials in high dielectric capacitors and tunable microwave devices. Understanding its structure is crucial to better control the domain configurations for future applications. In this paper, PbTiO3 thin films with variant thicknesses are deposited on (110) oriented GdScO3 substrates by Pulsed Laser Deposition (PLD) and investigated by using conventional transmission electron microscopy (TEM) and Cs-corrected Scanning TEM. Contrast analysis and electron diffractions reveal that PbTiO3 films are domain oriented consisting of a(1)/a(2) and a/c domain structure. The a(1)/a(2) domains are found to distribute periodically and its width increases with increasing film thickness following square root rule. Cs-corrected STEM imaging demonstrates that the domain walls of a(1)/a(2) domain structure have the rotation characteristic of 90 ferroelastic domain wall. The interchange of a(1)/a(2) domains induces the formation of vertex domains composed of two 90 and one 180 domain walls. Strains are mainly concentrated on the domain walls. The formation of this complex domain configuration is discussed in terms of the effect of the misfit strain, film thickness and cooling rate. These results provide novel information about a(1)/a(2) domain structures and are expected to shed some light on modulating a(1)/a(2) ferroelectric domain patterns in the design of ferroelectric-based devices. (C) 2017 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

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