4.6 Article

Tuning plasmonic properties of CuS thin films via valence band filling

期刊

RSC ADVANCES
卷 7, 期 18, 页码 11118-11122

出版社

ROYAL SOC CHEMISTRY
DOI: 10.1039/c6ra27076j

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资金

  1. Nano Material Technology Development Program through the National Research Foundation of Korea (NRF) - Ministry of Science, ICT and Future Planning [2009-0082580]
  2. Basic Science Program through NRF - MEST [2015R1A2A2A01003790]
  3. Basic Science Program through NRF - ICT, Republic of Korea [2015R1A2A2A01003790]
  4. BK-plus program
  5. National Research Foundation of Korea [2015R1A2A2A01003790] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

向作者/读者索取更多资源

In this study, we propose an interesting strategy for tuning the localized surface plasmon resonance (LSPR) of CuS thin films by filling the vacancies in the valence band by electrochemical reduction under acidic conditions leading to the decrease in free carrier concentration yielding CuS thin films with different LSPR properties.

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