期刊
ACS APPLIED MATERIALS & INTERFACES
卷 9, 期 21, 页码 18362-18368出版社
AMER CHEMICAL SOC
DOI: 10.1021/acsami.7b04298
关键词
amorphous MoS2/Si junctions; lateral photovoltaic (LPV); pulsed laser deposition (PLD); ultrafast relaxation; position-sensitive detectors; inversion layer
资金
- National Natural Science Foundation of China [51472064, 21471039, 51372056, 21671047]
- International Science and Technology Cooperation Program of China [2012DFR50020]
- Program for New Century Excellent Talents in University [NCET-13-0174]
- Fundamental Research Funds for the Central Universities
- Program for Innovation Research of Science in Harbin Institute of Technology (PIRS of HIT) [A201502, 201616]
The lateral photovoltaic (LPV) effect has attracted much attention for a long time because of its application in position-sensitive detectors (PSD). Here, we report the ultrafast response of the LPV in amorphous MoS2/Si (a-MoS2/Si) junctions prepared by the pulsed laser deposition (PLD) technique. Different orientations of the built-in field and the breakover voltages are observed for a-MoS2 films deposited on p- and n-type Si wafers, resulting in the induction of positive and negative voltages in the a-MoS2/n-Si and a-MoS2/p-Si junctions upon laser illumination, respectively. The dependence of the LPV on the position of the illumination shows very high sensitivity (183 mV mm(1)) and good linearity. The optical relaxation time of LPV with a positive voltage was about 5.8 mu s in a-MoS2/n-Si junction, whereas the optical relaxation time of LPV with a negative voltage was about 2.1 mu s in a-MoS2/p-Si junction. Our results clearly suggested that the inversion layer at the a-MoS2/Si interface made a good contribution to the ultrafast response of the LPV in a-MoS2/Si junctions. The large positional sensitivity and ultrafast relaxation of LPV may promise the a-MoS2/Si junctions applications in fast position-sensitive detectors
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