期刊
OPTICAL MATERIALS EXPRESS
卷 7, 期 3, 页码 777-784出版社
OPTICAL SOC AMER
DOI: 10.1364/OME.7.000777
关键词
-
资金
- Ministry of Science and Technology [MOST 105-2221-E-009-073, 105-2221-E-259-003, 105-2221E-218-001]
- Center for Integrated Nanotechnologies
- U.S. Department of Energy, Office of Basic Energy Sciences Nanoscale Science Research Center
The plasmonic properties of titanium nitride (TiN) films depend on the type of substrate when using typical deposition methods such as sputtering. Here we show atomic layer deposition (ALD) of TiN films with very weak dependence of plasmonic properties on the substrate, which also suggests the prediction and evaluation of plasmonic performance of TiN nanostructures on arbitrary substrates under a given deposition condition. Our results also observe that substrates with more nitrogen-terminated (N-terminated) surfaces will have significant impact on the deposition rate as well as the film plasmonic properties. We further illustrate that the plasmonic properties of ALD TiN films can be tailored by simply adjusting the deposition and/or post-deposition annealing temperatures. Such characteristics and the capability of conformal coating make ALD TiN films on templates ideal for applications that require the fabrication of complex 3D plasmonic nanostructures. (C) 2017 Optical Society of America
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据