4.6 Article

Modulation-doped β-(Al0.2Ga0.8)2O3/Ga2O3 field-effect transistor

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APPLIED PHYSICS LETTERS
卷 111, 期 2, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.4993569

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资金

  1. Office of Naval Research (EXEDE MURI) [N00014-12-1-0976]
  2. Department of the Defense
  3. Defense Threat Reduction Agency [HDTRA11710034]
  4. Ohio State University Institute of Materials Research (IMR) Multidisciplinary Team Building Grant
  5. Air Force Research Laboratory, WPAFB, Dayton Ohio
  6. U.S. Department of Defense (DOD) [HDTRA11710034] Funding Source: U.S. Department of Defense (DOD)

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Modulation-doped heterostructures are a key enabler for realizing high mobility and better scaling properties for high performance transistors. We report the realization of a modulation-doped two-dimensional electron gas (2DEG) at the beta-(Al0.2Ga0.8)(2)O-3/Ga2O3 heterojunction by silicon delta doping. The formation of a 2DEG was confirmed using capacitance voltage measurements. A modulation-doped 2DEG channel was used to realize a modulation-doped field-effect transistor. The demonstration of modulation doping in the beta-(Al0.2Ga0.8)(2)O-3/Ga2O3 material system could enable heterojunction devices for high performance electronics. Published by AIP Publishing.

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