期刊
ADVANCED MATERIALS
卷 29, 期 29, 页码 -出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201700990
关键词
chemical vapor deposition; monolayers; ultrafast growth; WSe2
类别
资金
- Ministry of Science and Technology of the People's Republic of China [2016YFA0200101, 2016YFB0401104]
- National Natural Science Foundation of China (NSFC) [51325205, 51290273, 51521091, 51472249, 51390473, 51272256, 61422406, 61574143]
- Chinese Academy of Sciences [KGZD-EW-303-1, KGZD-EW-T06]
- NSFC
The ultrafast growth of high-quality uniform monolayer WSe2 is reported with a growth rate of approximate to 26 mu m s(-1) by chemical vapor deposition on reusable Au substrate, which is approximate to 2-3 orders of magnitude faster than those of most 2D transition metal dichalcogenides grown on nonmetal substrates. Such ultrafast growth allows for the fabrication of millimeter-size single-crystal WSe2 domains in approximate to 30 s and large-area continuous films in approximate to 60 s. Importantly, the ultrafast grown WSe2 shows excellent crystal quality and extraordinary electrical performance comparable to those of the mechanically exfoliated samples, with a high mobility up to approximate to 143 cm(2) V-1 s(-1) and ON/OFF ratio up to 9 x 10(6) at room temperature. Density functional theory calculations reveal that the ultrafast growth of WSe2 is due to the small energy barriers and exothermic characteristic for the diffusion and attachment of W and Se on the edges of WSe2 on Au substrate.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据