4.8 Article

Direct Immersion Annealing of Thin Block Copolymer Films

期刊

ACS APPLIED MATERIALS & INTERFACES
卷 7, 期 39, 页码 21639-21645

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsami.5b06259

关键词

mixed solvents; direct immersion annealing; block copolymer ordering; kinetics

资金

  1. Department of Energy [DE-SC0005364]
  2. National Science Foundation [NSF DMR-1411046]
  3. U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences [DE-AC02-98CH10886]
  4. U.S. Department of Energy (DOE) [DE-SC0005364] Funding Source: U.S. Department of Energy (DOE)
  5. Direct For Mathematical & Physical Scien
  6. Division Of Materials Research [1411046] Funding Source: National Science Foundation

向作者/读者索取更多资源

We demonstrate ordering of thin block copolymer (BC?) films via direct immersion annealing (DIA) at enhanced rate leading to stable morphologies. The BCP films are immersed in carefully selected mixtures of good and marginal solvents that can impart enhanced polymer mobility, while inhibiting film dissolution. DIA is compatible with roll-to-roll assembly manufacturing and has distinct advantages over conventional thermal annealing and batch processing solvent-vapor annealing methods. We identify three solvent composition-dependent BCP film ordering regimes in DIA for the weakly interacting polystyrene poly(methyl methacrylate) (PS-PMMA) system: rapid short-range order, optimal long-range order, and a film instability regime. Kinetic studies in the optimal long-range order processing regime as a function of temperature indicate a significant reduction of activation energy for BCP grain growth compared to oven annealing at conventional temperatures. An attractive feature of DIA is its robustness to ordering other BCP (e.g. PS-P2VP) and PS-PMMA systems exhibiting spherical, lamellar and cylindrical ordering.

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