4.6 Article

Structural and magnetic phase transitions in chromium nitride thin films grown by rf nitrogen plasma molecular beam epitaxy

期刊

PHYSICAL REVIEW B
卷 96, 期 10, 页码 -

出版社

AMER PHYSICAL SOC
DOI: 10.1103/PhysRevB.96.104433

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资金

  1. US Department of Energy, Office of Basic Energy Sciences, Division of Materials Sciences and Engineering [DE-FG02-06ER46317]
  2. Conacyt [281052]
  3. DGAPA-UNAM [IN100516]
  4. DGTIC-UNAM supercomputing center [LANCAD-UNAM-DGTIC-051]

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A magnetostructural phase transition is investigated in single-crystal chromium nitride (CrN) thin films grown by rf plasma molecular beam epitaxy on MgO(001) substrates. While still within the vacuum environment following molecular beam epitaxy growth, in situ low-temperature scanning tunneling microscopy, and in situ variable low-temperature reflection high-energy electron diffraction are applied, revealing an atomically smooth and metallic CrN(001) surface, and an in-plane structural transition from 1x1 (primitive CrN unit cell) to root 2x root v 2 -R45 degrees with a transition temperature of (278 +/- 3) K, respectively. Ex situ temperature-dependent measurements using neutron diffraction are also performed, looking at the structural peaks and likewise revealing a first-order structural transition along the [111] out-of-plane direction, with transition temperatures of (268 +/- 3) K. Turning to the magnetic peaks, neutron diffraction confirms a clear magnetic transition from paramagnetic at room temperature to antiferromagnetic at low temperatures with a sharp, first-order phase transition and a Nel temperature of (270 +/- 2) K or (280 +/- 2) K for two different films. In addition to the experimental measurements of structural and magnetic ordering, we also discuss results from first-principles theoretical calculations which explore various possible magnetostructural models.

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