Optical band gap shift in thin LiNbO3 films grown by radio-frequency magnetron sputtering

Thin polycrystalline LiNbO3 films were deposited by the radio-frequency magnetron sputtering (RFMS) method and ion-beam sputtering (IBS) method under different conditions. Study of the adsorption band edge of fabricated films reveals direct and indirect optical transition. Depending on the particular technological sputtering RFMS regime, the direct energy gap varies from 3.8 to 4.4 eV. Band tails induced by the defects formation due to the reactive plasma effect on the film structure are responsible for indirect optical transitions in the studied films. Thermal annealing has a prominent effect on trap concentration and strain in as-grown films leading to rise in direct band energy up to 4.4 eV which is close to the value for bulk LiNbO3.