期刊
ACS APPLIED MATERIALS & INTERFACES
卷 9, 期 44, 页码 38977-38983出版社
AMER CHEMICAL SOC
DOI: 10.1021/acsami.7b10974
关键词
SBH; Pd contact; MoS2; XPS; thin film
资金
- Center for Low Energy Systems Technology (LEAST), one of six centers - STARnet phase of the Focus Center Research Program (FCRP), a Semiconductor Research Corporation program - MARCO
- DARPA
- US/Ireland R&D Partnership (UNITE) under the NSF award [ECCS-1407765]
- National Natural Science Foundation of China [61504070]
- Fundamental Research Funds for the Central Universities
- Tianjin Natural Science Foundation [15JCYBJC52000]
- Directorate For Engineering
- Div Of Electrical, Commun & Cyber Sys [1407765] Funding Source: National Science Foundation
MoS2, as a model transition metal dichalcogenide, is viewed as a potential channel material in future nanoelectronic and optoelectronic devices. Minimizing the contact resistance of the metal/MoS2 junction is critical to realizing the potential of MoS2-based devices. In this work, the Schottky barrier height (SBH) and the band structure of high work function Pd metal on MoS2 have been studied by in situ X-ray photoelectron spectroscopy (XPS). The analytical spot diameter of the XPS spectrometer is about 400 mu m, and the XPS signal is proportional to the detection area, so the influence of defect-mediated parallel conduction paths on the SBH does not affect the measurement. The charge redistribution by Pd on MoS2 is detected by XPS characterization, which gives insight into metal contact physics to MoS2 and suggests that interface engineering is necessary to lower the contact resistance for the future generation electronic applications.
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